Electron Beam Lithography (JEOL JBX-5500ZD)
The JEOL JBX-5500ZD is installed and evaluated on April 2012 at High Density Electronics Center (HiDEC) at University of Arkansas Fayetteville. This is one of the advanced research equipment purchased by NSF EPSCoR Arkansas GREEN center. The unique capability of this JEOL 5500 is that a fifth lens can be used to get a smaller beam spot size and write sub-10 nm features at 50 kV.
The stage can load a wafer substrate from small pieces to 100mm or a mask blank up to 3 inches. The evaluated overlay and stitching accuracies are tested less than 10 nm under high speed mode. The demonstrate minimum line width is around 6 nm.
The JEOL JBX-5500ZD system has been up and running since April 2012. Active research projects utilizing the tool include such topics as advanced metallic nanostructure enhanced photovoltaic devices, nano wire devices fabrication, nanostructure fabrication for nanophotonics, high resolution patterns for nano indentations, and high frequency RF devices.
Currently Dr. Shui-Qing (Fisher) Yu’s group from EPSCoR Arkansas GREEN center is mainly working on this machine and developing various recipes for different applications. We encourage all the academic and industrial collaborations and usages, and we do not hesitate to share the developed recipes. Please feel free to contact us for further information.
JEOL test pattern fabricated on c-Si
JEOL test pattern fabricated on c-Si
Stitching and overlay resolution evaluation test (less than 10 nm)
Stitching and overlay resolution evaluation test (less than 10 nm)
100 nm width metallic nanowire array
100 nm width metallic split ring resonator array
100 nm width metallic coupled split ring resonator array
70 nm width metallic line
300 nm diameter metallic nanodisk
80 nm diameter metallic nanodisk
100 nm width metallic nanoring array
100 nm width metallic nanoring with 400 nm out diameter
100 nm width metallic split ring resonator array
100 nm width metallic nanowire array
DRIE etching result (600 nm etching depth)
DRIE etching result (2000 nm etching depth)
500 nm width metallic gratings array
100 nm width and 1000 nm pitch metallic fishnet
100 nm width metallic coupled split ring resonator array
100 nm width metallic coupled split ring resonator array (rotated and tilted image)
100 nm width and 70 nm gap metallic coupled split ring resonator array
Metallic fishnet structure on a-Si
Metallic fishnet structure on a-Si (roated and tilted image)
Schottky contact a-Si solar cell
Metallic nanostructures integrated c-Si solar cell
Single silicon nanowire device
