Electron Beam Lithography (JEOL JBX-5500ZD)
The JEOL JBX-5500ZD is installed and evaluated on April 2012 at High Density Electronics Center (HiDEC) at University of Arkansas Fayetteville. This is one of the advanced research equipment purchased by NSF EPSCoR Arkansas GREEN center. The unique capability of this JEOL 5500 is that a fifth lens can be used to get a smaller beam spot size and write sub-10 nm features at 50 kV.
The stage can load a wafer substrate from small pieces to 100mm or a mask blank up to 3 inches. The evaluated overlay and stitching accuracies are tested less than 10 nm under high speed mode. The demonstrate minimum line width is around 6 nm.
The JEOL JBX-5500ZD system has been up and running since April 2012. Active research projects utilizing the tool include such topics as advanced metallic nanostructure enhanced photovoltaic devices, nano wire devices fabrication, nanostructure fabrication for nanophotonics, high resolution patterns for nano indentations, and high frequency RF devices.
Currently Dr. Shui-Qing (Fisher) Yu’s group from EPSCoR Arkansas GREEN center is mainly working on this machine and developing various recipes for different applications. We encourage all the academic and industrial collaborations and usages, and we do not hesitate to share the developed recipes. Please feel free to contact us for further information.